Study: China's Patent Policies and Innovation

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"Dulling the Cutting Edge: How Patent-Related Policies and Practices Hamper Innovation" evaluates the current state of China's patent applications, and how policies such as quantitative targets hinder genuine innovation.

Find over 50 practical recommendations to remedy the concerns flagged in the analysis. Among them are sections exploring:

  • Though patents are exploding and innovation is on the rise, patent quality has not kept up. The strength of China's innovation appears over-hyped.
  • The reasons for China's patent quality and innovation shortcomings, investigated using in-depth, on-the-ground research and analysis.
  • How patent-related policies, practices, and other measures in China collectively hamper both patent quality and innovation at large.

This study was authored by Dan Prud'homme, Business Manager of the IPR Working Group and the R&D Forum, based in the Shanghai chapter. Members of those groups contributed comments. European Chamber members are knowledge leaders in their areas of industry, and are the chief contributors to the Chamber's influential publications.

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Publication title
Dulling the Cutting Edge: How Patent-Related Policies and Practices Hamper Innovation
Executive Summary: Dulling the Cutting Edge: How Patent-Related Policies and Practices Hamper Innovation - 概要: 创新迷途:中国的专利政策与实践如何阻碍了创新的脚步